The activity of the laboratory is dedicated to the study of the fundamental structural properties of modern materials used in nuclear power and micro- and optoelectronics using ion channeling techniques (RBS, NRA, PIXE). A strong emphasis is placed on the quantitative analysis of:

• layer thickness and stoichiometry
• crystalline quality of the material
• depth distributions of elements in doped materials
• processes of accumulation and transformation of defect structures occurring in crystals under the influence of interaction with high-energy ionising radiation, e.g. during ion bombardment in the implantation process
• optimisation of annealing processes (RTA, FLA, PEBA),
• the influence of annealing on the depth distribution and evolution of post-implantation defects as well as on lattice localization and depth migration of the dopant.

Materials studied by us so far and currently include: nickel (Ni) and its alloys (NiFe, NiFeCoCr), SrTiO3, MgAl2O4, group III-N nitrides (GaN, AlN, AlGaN, InGaN), oxides (ZnO, Ga2O3, UO2, U4O9, ZrO2, MgO) and many others. For analysis, programmes based on Monte Carlo (MC) and Molecular Dynamics (MD) simulation techniques are used. The laboratory is involved in the development and validation of the globally unique McChasy simulation software, based on the Monte Carlo method, which allows the analysis of experimental data obtained using ion backscattering (RBS) in the channeling mode."

Contact
Laboratory Head: dr Cyprian Mieszczyński
email: cyprian.mieszczynski@ncbj.gov.pl
tel.: (+48) 22 273 12 66

We work on the manufacturing processes of surface layers and coatings and study the phenomena accompanying them in order to achieve the desired application effects.

Within our research activities, we focus on plasma surface engineering and pulsed plasma issues. Our research in plasma surface engineering covers a broad spectrum of activities, including the synthesis of materials using advanced plasma technologies. We aim to develop innovative methods for the fabrication of surface layers through the use of plasmas, allowing us to achieve unique material properties. We are also investigating the effects of high-energy pulsed plasma on the surface of materials, analysing the effects and applicability in practice.

Our work in this area aims to understand the deeper phenomena associated with pulsed plasma and create innovative solutions used in materials synthesis processes.

Priorities:

• Development of plasma surface engineering techniques with special emphasis on impulse processes (Multifaceted problems of impulse energy dosing in plasma processes)
• Materials synthesis using plasma surface engineering techniques

Ongoing topics

• Work on the development of technologies for the synthesis of materials of medium and high entropy in the form of films (by magnetron sputtering and by arc method)
• Synthesis and characterisation of metastable nitrides (Cu-N, Sn-N, Ni-N) obtained by pulsed magnetron sputtering.
• Investigations into the role of pulsed plasma in material structure formation
• Work on the design and fabrication of a hybrid photocathode for an XFEL/PolFEL type free-electron laser gun

The main techniques used in the laboratory are:
- cathodic arc sputtering method - layer synthesis
- pulsed magnetron sputtering method - layer synthesis
- intense plasma pulse generator of RPI type (IBIS I, IBIS II) - plasma-material interaction.

The laboratory cooperates with both Polish and foreign entities. The most important scientific partners include:
- Warsaw University of Technology, Faculty of Materials Engineering,
- Institute of Physics of the Polish Academy of Sciences in Warsaw,
- Bydgoszcz University of Technology; Faculty of Technology and Chemical Engineering; Institute of Mathematics and Physics;
- Łukasiewicz Research Network - Tele and Radio Research Institute in Warsaw,
- Łukasiewicz Research Network - Institute of Microelectronics and Photonics in Warsaw,
- Helmholtz-Zentrum Dresden Rossendorf in Dresden

Contact:
Laboratory Head: dr hab. inż. Katarzyna Nowakowska-Langier, prof. NCBJ
email:  katarzyna.nowakowska-langier@ncbj.gov.pl
tel.: (+48) 22 273 1446

The research carried out in the Ionic and Plasma Modification of Materials Laboratory deals with various aspects of surface modification of materials, both by depositing layers and by modifying near-surface areas. Ion, electron and plasma beams as well as combinations of these (hybrid methods) are used for this purpose.

A wide range of materials are subjected to modification, from classical metals and their alloys, through ceramic, composite and semiconductor materials to cellulose and Wood Plastic Composites (WPC).

Testing/modification applies to both samples and finished parts, e.g. tools. The extensive equipment of the equipment allows modification of samples/tools also with more complex shapes.

Material modification processes are supported by modelling.

Research is conducted within the framework of bilateral cooperation, research projects and commercial services.

Contact
Laboratory Head: dr inż. Marek Barlak
email:  marek.barlak@ncbj.gov.pl
tel.: (+48) 22 273 1644